Semiconductor & Computer Engineering
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Difference between revisions of "28 nm lithography process"
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{{lithography processes}} | {{lithography processes}} | ||
The '''28 nm lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process used as a stopgap between the [[32 nm lithography process|32 nm]] and [[22 nm lithography process|22 nm]] processes. Commercial [[integrated circuit]] manufacturing using 28 nm process began in 2011. This technology superseded by commercial [[22 nm lithography process|22 nm process]]. | The '''28 nm lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process used as a stopgap between the [[32 nm lithography process|32 nm]] and [[22 nm lithography process|22 nm]] processes. Commercial [[integrated circuit]] manufacturing using 28 nm process began in 2011. This technology superseded by commercial [[22 nm lithography process|22 nm process]]. | ||
| + | |||
| + | == Industry == | ||
| + | |||
| + | === Samsung === | ||
| + | {| class="wikitable" | ||
| + | |- | ||
| + | | || Measurement || Scaling from [[40 nm]] | ||
| + | |- | ||
| + | | Contacted Gate Pitch || 90 nm || 0.70x | ||
| + | |- | ||
| + | | Interconnect Pitch (M1P) || 96 nm || 0.82x | ||
| + | |- | ||
| + | | [[SRAM]] bit cell || 0.120 µm<sup>2</sup> || ?x | ||
| + | |} | ||
== 28 nm Microprocessors == | == 28 nm Microprocessors == | ||
Revision as of 21:49, 23 April 2016
Semiconductor lithography processes technology
The 28 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 32 nm and 22 nm processes. Commercial integrated circuit manufacturing using 28 nm process began in 2011. This technology superseded by commercial 22 nm process.
Industry
Samsung
| Measurement | Scaling from 40 nm | |
| Contacted Gate Pitch | 90 nm | 0.70x |
| Interconnect Pitch (M1P) | 96 nm | 0.82x |
| SRAM bit cell | 0.120 µm2 | ?x |
28 nm Microprocessors
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28 nm System on Chips
- Intel
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