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From WikiChip
80 nm lithography process
Semiconductor lithography processes technology |
|
The 80 nanometer (80 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 90 nm and 65 nm processes. Commercial integrated circuit manufacturing using 40 nm process began around 2004. This technology superseded by commercial 65 nm process by 2006.
Industry[edit]
Fab |
---|
1st Production |
Wafer |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
TSMC | Samsung | ||
---|---|---|---|
2005 | 2005 | ||
300mm | |||
Value | 90 nm Δ | Value | 90 nm Δ |
? nm | ?x | ? nm | ?x |
? nm | ?x | ? nm | ?x |
? µm2 | ?x | ? µm2 | ?x |
80 nm Microprocessors[edit]
This list is incomplete; you can help by expanding it.
80 nm System on Chips[edit]
This list is incomplete; you can help by expanding it.