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600 nm lithography process

The 600 nanometer (600 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.

Industry[edit]

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel (BiCMOS) Intel (CMOS) NEC IBM Motorola HP
CMOS-4S CMOS14B
1994 1994 1992 1993 1994
Value Value Value Value Value Value
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm²  ? µm²  ? µm²  ? µm²  ? µm²  ? µm²

600 nm Microprocessors[edit]

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600 nm Microarchitectures[edit]

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