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20 nm lithography process

The 20 nanometer (20 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 22 nm and 16 nm processes. The term "20 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial integrated circuit manufacturing using 20 nm process began in 2014. This technology superseded by commercial 16 nm process.


Process Name​
Metal Layers​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Samsung TSMC
300 mm
Value 28 nm Δ Value 28 nm Δ
86 nm 0.75x 90 nm 0.77x
64 nm 0.71x 64 nm 0.67x
0.081 µm² 0.675x 0.081 µm² 0.64x


TSMC demonstrated their 112 Mebibit SRAM wafer from their 20 nm HKMG process at the 2013 IEEE ISSCC.

20 nm Microprocessors[edit]

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20 nm Microarchitectures[edit]

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  • Chang, Jonathan, et al. "A 20nm 112Mb SRAM in High-к metal-gate with assist circuitry for low-leakage and low-V MIN applications." Solid-State Circuits Conference Digest of Technical Papers (ISSCC), 2013 IEEE International. IEEE, 2013.
  • Shang, Huiling, et al. "High performance bulk planar 20nm CMOS technology for low power mobile applications." VLSI Technology (VLSIT), 2012 Symposium on. IEEE, 2012.