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650 nm lithography process

The 650 nanometer (650 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.

Industry[edit]

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Cypress IDT TI IBM Motorola
 
1992 1993 1993 1995 1995
Value Value Value Value Value
 ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm2  ? µm2  ? µm2  ? µm2  ? µm2

650 nm Microprocessors[edit]