From WikiChip
28 nm lithography process

The 28 nanometer (28 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 32 nm and 22 nm processes. Commercial integrated circuit manufacturing using 28 nm process began in 2011. This technology superseded by commercial 22 nm process.

Industry[edit]

Fab
Transistor​
Wafer​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell (HD)​
SRAM bit cell (LP)​
SRAM bit cell (HC)
Samsung TSMC GlobalFoundries STMicroelectronics UMC
Planar
300 mm
Value 40 nm Δ Value 40 nm Δ Value 40 nm Δ Value 40 nm Δ Value 40 nm Δ
90 nm 0.70x 117 nm 0.72x  ?nm  ?x  ?nm  ?x  ?nm  ?x
96 nm 0.82x 95 nm 0.81x  ?nm  ?x  ?nm  ?x  ?nm  ?x
0.120 µm²  ?x 0.127 µm² 0.52x 0.120 µm²  ?x 0.120 µm²  ?x 0.124 µm²  ?x
0.155 µm² 0.197 µm²  ?x  ? µm²  ?x
0.152 µm²  ?x

28 nm Microprocessors[edit]

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28 nm Microarchitectures[edit]

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