The 10 nm lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by 7 nm process 2019.

Industry

Intel

	Measurement	Scaling from 14 nm
Fin Pitch	? nm	?x
Contacted Gate Pitch	55 nm	0.78x
Interconnect Pitch (M1P)	38 nm	0.74x
SRAM bit cell	? µm2	?x

Global Foundries / Samsung

	Measurement	Scaling from 14 nm	Notes
Fin Pitch	? nm	?x
Contacted Gate Pitch	64 nm	0.82x
Interconnect Pitch (M1P)	48 nm	0.75x
SRAM bit cell	0.049 µm2	0.61x	High Performance
SRAM bit cell	0.04 µm2	0.63x	High Density

TSMC

	Measurement	Scaling from 16 nm
Fin Pitch	? nm	?x
Contacted Gate Pitch	70 nm	0.78x
Interconnect Pitch (M1P)	46 nm	0.72x
SRAM bit cell	? µm2	?x

10 nm Microprocessors

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10 nm System on Chips

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10 nm Microarchitectures

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