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Difference between revisions of "10 nm lithography process"

(Gate pitch (and scaling) changed from 55 to 54nm according to http://www.eetimes.com/document.asp?doc_id=1330311)
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The '''10 nanometer (10 nm) lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[14 nm lithography process|14 nm process]] stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial [[integrated circuit]] manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by [[7 nm lithography process|7 nm process]] 2019.
 
The '''10 nanometer (10 nm) lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[14 nm lithography process|14 nm process]] stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial [[integrated circuit]] manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by [[7 nm lithography process|7 nm process]] 2019.
 
== Industry ==
 
== Industry ==
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{{future information}}
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{{scrolling table/top|style=text-align: right; | first=Fab
 
{{scrolling table/top|style=text-align: right; | first=Fab
 
  |Process Name
 
  |Process Name

Revision as of 14:44, 3 September 2016

The 10 nanometer (10 nm) lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by 7 nm process 2019.

Industry

Symbol version future.svg Preliminary Data! Information presented in this article deal with future products, data, features, and specifications that have yet to be finalized, announced, or released. Information may be incomplete and can change by final release.


Fab
Process Name​
1st Production​
 ​
Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell (HP)​
SRAM bit cell (HD)
Intel Samsung TSMC
P1274
2017 2017
Value 14 nm Δ Value 14 nm Δ Value 16 nm Δ
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
54 nm 0.77x 64 nm 0.82x 70 nm 0.78x
38 nm 0.74x 48 nm 0.75x 46 nm 0.72x
 ? µm2  ?x 0.049 µm2 0.61x  ? µm2  ?x
 ? µm2  ?x 0.040 µm2 0.63x  ? µm2  ?x

10 nm Microprocessors

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10 nm System on Chips

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10 nm Microarchitectures

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