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From WikiChip
28 nm lithography process
Semiconductor lithography processes technology |
|
The 28 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 32 nm and 22 nm processes. Commercial integrated circuit manufacturing using 28 nm process began in 2011. This technology superseded by commercial 22 nm process.
Industry
Samsung
Measurement | Scaling from 40 nm | |
Contacted Gate Pitch | 90 nm | 0.70x |
Interconnect Pitch (M1P) | 96 nm | 0.82x |
SRAM bit cell | 0.120 µm2 | ?x |
TSMC
Measurement | Notes | |
Contacted Gate Pitch | 117 nm | |
Interconnect Pitch (M1P) | ? nm | |
SRAM bit cell | 0.127 µm2 | High Density |
SRAM bit cell | 0.155 µm2 | Low Voltage |
28 nm Microprocessors
This list is incomplete; you can help by expanding it.
28 nm System on Chips
- Intel
This list is incomplete; you can help by expanding it.