The 45 nm lithography process is a full node semiconductor manufacturing process following the 55 nm process stopgap. Commercial integrated circuit manufacturing using 45 nm process began in 2007. This technology was superseded by the 40 nm process (HN) / 32 nm process (FN) in 2010.

Industry

Intel

	Measurement	Scaling from 65 nm
Contacted Gate Pitch	180 nm	0.82x
Interconnect Pitch (M1P)	160 nm	0.76x
SRAM bit cell	0.346 µm2	0.61x

45 nm Microprocessors

• Intel
  • Atom
  • Core i7EE

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45 nm System on Chips

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45 nm Microarchitectures

• Intel:
  • Bonnell
  • Nehalem
  • Penryn

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