Revision as of 12:37, 9 June 2017

Semiconductor lithography processes technology

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The 16 nanometer (16 nm) lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. The term "16 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. This technology is set to be replaced with 10 nm process in 2017.

Industry

An enhanced version of TSMC's 16nm process was introduced in late 2016 called "12nm".

TSMC

TSMC uses the same BEOL as its 20nm process. They named their process 16 nm which reflects those relaxed pitches. TSMC demonstrated their 128 Mebibit SRAM wafer from their 16 nm HKMG FinFET process at the 2014 IEEE ISSCC. TSMC followed their 16FF process by the 16FF+ which provided roughly 10-15% performance improvement. A final 16FFC (16FF Compact) designed to reduce cost through less masks while using half the power.

TSMC 128 Mib SRAM demo 16 nm wafer
Technology 16 nm HK-MG FinFET Metal scheme 1 Poly / 7 Metal Supply voltage 0.85 V (core) 1.8 V (i/o) Bit cell size 0.07 µm² macro configs 4096x32 MUX16 258 bits/BL 272 bits/WL Capacity 128 Mib Test Features Row/Column Redundancy Programmable E-fuse Die Size 42.6 mm²

16 nm Microprocessors

• PEZY
  • PEZY-SC2
• MediaTek
  • Helio

This list is incomplete; you can help by expanding it.

16 nm Microarchitectures

• ARM
  • Cortex-A55

This list is incomplete; you can help by expanding it.

References

• Chen, Yen-Huei, et al. "A 16 nm 128 Mb SRAM in High-κ Metal-Gate FinFET Technology With Write-Assist Circuitry for Low-VMIN Applications." IEEE Journal of Solid-State Circuits 50.1 (2015): 170-177.
• Wu, Shien-Yang, et al. "A 16nm FinFET CMOS technology for mobile SoC and computing applications." Electron Devices Meeting (IEDM), 2013 IEEE International. IEEE, 2013.
• TechInsights/Chipworks, Kevin Gibb, The ConFab 2016