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2 µm lithography process
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The 2 µm lithography process was the semiconductor process technology used by the some semiconductor companies in the mid to late 1980s. By the mid 80s this process was replaced by 1.5 µm, 1.3 µm, and 1.2 µm processes.

Industry[edit]

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel Intel Toshiba STMicro Motorola TI AMD
P414.1 (HMOS-II) P421.X (HMOS-E) BCD-Offline
1980 1980 1986 1992
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2

Microprocessors[edit]

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