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Difference between revisions of "10 nm lithography process"

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== 10 nm System on Chips==
 
== 10 nm System on Chips==
 
* MediaTek {{mediatek|Helio X30}}
 
* MediaTek {{mediatek|Helio X30}}
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* Qualcomm {{qualcomm|Snapdragon 830}}
 
{{expand list}}
 
{{expand list}}
  

Revision as of 09:47, 31 July 2016

The 10 nanometer (10 nm) lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by 7 nm process 2019.

Industry

Fab
Process Name​
1st Production​
 ​
Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell (HP)​
SRAM bit cell (HD)
Intel Samsung TSMC
P1274
 
Value 14 nm Δ Value 14 nm Δ Value 16 nm Δ
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
55 nm 0.78x 64 nm 0.82x 70 nm 0.78x
38 nm 0.74x 48 nm 0.75x 46 nm 0.72x
 ? µm2  ?x 0.049 µm2 0.61x  ? µm2  ?x
 ? µm2  ?x 0.040 µm2 0.63x  ? µm2  ?x

10 nm Microprocessors

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10 nm System on Chips

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10 nm Microarchitectures

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