Semiconductor & Computer Engineering
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Difference between revisions of "10 nm lithography process"
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| − | The '''10 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[14 nm lithography process|14 nm process]] stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial [[integrated circuit]] manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by [[7 nm lithography process|7 nm process]] 2019. | + | The '''10 nanometer (10 nm) lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[14 nm lithography process|14 nm process]] stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial [[integrated circuit]] manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by [[7 nm lithography process|7 nm process]] 2019. |
== Industry == | == Industry == | ||
{{scrolling table/top|style=text-align: right; | first=Fab | {{scrolling table/top|style=text-align: right; | first=Fab | ||
Revision as of 04:56, 24 May 2016
Semiconductor lithography processes technology
The 10 nanometer (10 nm) lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by 7 nm process 2019.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Fin Pitch |
| Fin Width |
| Fin Height |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell (HP) |
| SRAM bit cell (HD) |
| Intel | Samsung | TSMC | |||
|---|---|---|---|---|---|
| P1274 | |||||
| Value | 14 nm Δ | Value | 14 nm Δ | Value | 16 nm Δ |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| 55 nm | 0.78x | 64 nm | 0.82x | 70 nm | 0.78x |
| 38 nm | 0.74x | 48 nm | 0.75x | 46 nm | 0.72x |
| ? µm2 | ?x | 0.049 µm2 | 0.61x | ? µm2 | ?x |
| ? µm2 | ?x | 0.040 µm2 | 0.63x | ? µm2 | ?x |
10 nm Microprocessors
This list is incomplete; you can help by expanding it.
10 nm System on Chips
- MediaTek Helio X30
This list is incomplete; you can help by expanding it.
10 nm Microarchitectures
- Intel
This list is incomplete; you can help by expanding it.
