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Difference between revisions of "10 nm lithography process"

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{{lithography processes}}
 
{{lithography processes}}
The '''10 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[14 nm lithography process|14 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 10 nm process is set to began in 2017. This technology is set to replaced by [[7 nm lithography process|7 nm process]] 2019.
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The '''10 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[14 nm lithography process|14 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 10 nm process is set to begin in 2017. This technology is set to replaced by [[7 nm lithography process|7 nm process]] 2019.
  
 
== 10 nm Microprocessors==
 
== 10 nm Microprocessors==

Revision as of 21:48, 23 April 2016

The 10 nm lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to replaced by 7 nm process 2019.

10 nm Microprocessors

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10 nm System on Chips

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10 nm Microarchitectures

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