The 16 nm lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. This technology is set to replaced by 14 nm process (HN) (2014) and 10 nm process (FN) in 2017.

Industry

TSMC

	Measurement
Fin Pitch	48 nm
Contacted Gate Pitch	90 nm
Interconnect Pitch (M1P)	64 nm
SRAM bit cell	0.07 µm2

16 nm Microprocessors

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16 nm System on Chips

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16 nm Microarchitectures

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