The 10 nm lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by 7 nm process 2019.

Industry

Fab
Process Name​
1st Production​
​
Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell (HP)​
SRAM bit cell (HD)

Intel		Samsung		TSMC
P1274
Value	14 nm Δ	Value	14 nm Δ	Value	16 nm Δ
? nm	?x	? nm	?x	? nm	?x
? nm	?x	? nm	?x	? nm	?x
? nm	?x	? nm	?x	? nm	?x
55 nm	0.78x	64 nm	0.82x	70 nm	0.78x
38 nm	0.74x	48 nm	0.75x	46 nm	0.72x
? µm2	?x	0.049 µm2	0.61x	? µm2	?x
? µm2	?x	0.040 µm2	0.63x	? µm2	?x

10 nm Microprocessors

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10 nm System on Chips

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10 nm Microarchitectures

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