The 22 nm lithography process is a full node semiconductor manufacturing process following the 28 nm process stopgap. Commercial integrated circuit manufacturing using 22 nm process began in 2008 for memory and 2012 for MPUs. This technology was replaced by with 20 nm process (HN) in 2014 and 16 nm process (FN) in late 2015.

Industry

Intel

22 nm was Intel's first generation of Tri-gate FinFET transistors.

	Measurement	Scaling from 32 nm
Fin Pitch	60 nm
Contacted Gate Pitch	90 nm	0.80x
Interconnect Pitch (M1P)	80 nm	0.71x
SRAM bit cell	0.1080 µm2

SoC Interconnect Design Rules
Layer	Pitch	Process	Dielectric Materials	CPU	SoC
Fin	60 nm	-	-	Fin	Fin
Contact	90 nm	SAC	-	Contact	Contact
M1	90 nm	SAV	ULK CDO	M1	M1
MT - 1x	80 nm	SAV	ULK CDO	M2/M3	2-6 layers
MT - 1.4x	112 nm	SAV	ULK CDO	M4	Semi-global
MT - 2x	160 nm	SAV	ULK CDO	M5	Semi-global
MT - 3x	240 nm	SAV	ULK CDO	M6	Global Routing
MT - 4x	320 nm 360 nm	Via First	LK CDO	M7/M8	Global Routing
MT - TOP	14 µm	Plate Up	Polymer	M9	Top Metal

22 nm Microprocessors

• Intel
  • Core i7EE

This list is incomplete; you can help by expanding it.

22 nm System on Chips

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22 nm Microarchitectures

• Intel:
  • Haswell
  • Ivy Bridge
  • Silvermont

This list is incomplete; you can help by expanding it.