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From WikiChip
65 nm lithography process
Semiconductor lithography processes technology |
|
The 65 nm lithography process is a full node semiconductor manufacturing process following the 80 nm process stopgap. Commercial integrated circuit manufacturing using 65 nm process began in 2006. This technology was superseded by the 55 nm process (HN) / 45 nm process (FN) in 2007.
Contents
Industry
Intel
Measurement | Scaling from 90 nm | |
Contacted Gate Pitch | 220 nm | 0.85x |
Interconnect Pitch (M1P) | 210 nm | 0.95x |
SRAM bit cell | 0.570 µm2 | 0.61x |
65 nm Microprocessors
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65 nm System on Chips
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65 nm Microarchitectures
- Intel
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