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45 nm lithography process
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The 45 nm lithography process is a full node semiconductor manufacturing process following the 55 nm process stopgap. Commercial integrated circuit manufacturing using 45 nm process began in 2007. This technology was superseded by the 40 nm process (HN) / 32 nm process (FN) in 2010.

45 nm Microprocessors

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45 nm System on Chips

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45 nm Microarchitectures

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