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22 nm lithography process
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The 22 nm lithography process is a full node semiconductor manufacturing process following the 28 nm process stopgap. Commercial integrated circuit manufacturing using 22 nm process began in 2008 for memory and 2012 for MPUs. This technology was replaced by with 20 nm process (HN) in 2014 and 16 nm process (FN) in late 2015.

Industry

Intel

22 nm was Intel's first generation of Tri-gate FinFET transistors.

Measurement Scaling from 32 nm
Fin Pitch 60 nm
Contacted Gate Pitch 90 nm 0.80x
Interconnect Pitch (M1P) 80 nm 0.71x
SRAM bit cell 0.1080 µm2

22 nm Microprocessors

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22 nm System on Chips

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22 nm Microarchitectures

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