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Difference between revisions of "16 nm lithography process"
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Revision as of 12:51, 22 November 2016
Semiconductor lithography processes technology |
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The 16 nanometer (16 nm) lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. The term "16 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. This technology is set to be replaced with 10 nm process in 2017.
Industry
Fab |
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Wafer |
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Fin Pitch |
Fin Width |
Fin Height |
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
16 nm Microprocessors
- PEZY PEZY-SC2
This list is incomplete; you can help by expanding it.
16 nm Microarchitectures
This list is incomplete; you can help by expanding it.