Semiconductor & Computer Engineering
From WikiChip
Difference between revisions of "10 nm lithography process"
(→Industry) |
(→10 nm Microarchitectures) |
||
| Line 46: | Line 46: | ||
== 10 nm Microarchitectures== | == 10 nm Microarchitectures== | ||
| + | * Intel | ||
| + | ** {{intel|Cannonlake}} | ||
| + | ** {{intel|Icelake}} | ||
{{expand list}} | {{expand list}} | ||
[[Category:Lithography]] | [[Category:Lithography]] | ||
Revision as of 20:12, 24 April 2016
Semiconductor lithography processes technology
The 10 nm lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by 7 nm process 2019.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Fin Pitch |
| Fin Width |
| Fin Height |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell (HP) |
| SRAM bit cell (HD) |
| Intel | Samsung | TSMC | |||
|---|---|---|---|---|---|
| P1274 | |||||
| Value | 14 nm Δ | Value | 14 nm Δ | Value | 16 nm Δ |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| 55 nm | 0.78x | 64 nm | 0.82x | 70 nm | 0.78x |
| 38 nm | 0.74x | 48 nm | 0.75x | 46 nm | 0.72x |
| ? µm2 | ?x | 0.049 µm2 | 0.61x | ? µm2 | ?x |
| ? µm2 | ?x | 0.040 µm2 | 0.63x | ? µm2 | ?x |
10 nm Microprocessors
This list is incomplete; you can help by expanding it.
10 nm System on Chips
This list is incomplete; you can help by expanding it.
10 nm Microarchitectures
- Intel
This list is incomplete; you can help by expanding it.