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    Difference between revisions of "28 nm lithography process"    
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== Industry ==  | == Industry ==  | ||
| − | + | {{scrolling table/top|style=text-align: right; | first=Fab  | |
| − | + |  |   | |
| − | {  | + |  |Contacted Gate Pitch  | 
| + |  |Interconnect Pitch (M1P)  | ||
| + |  |SRAM bit cell (HD)  | ||
| + |  |SRAM bit cell (LP)  | ||
| + | }}  | ||
| + | {{scrolling table/mid}}  | ||
|-  | |-  | ||
| − | | |  | + | ! colspan="2" | [[Samsung]] !! colspan="2" | [[TSMC]]  | 
|-  | |-  | ||
| − | + | ! Value !! [[40 nm]] Δ !! Value !! [[40 nm]] Δ  | |
|-  | |-  | ||
| − | |   | + | | 90 nm || 0.70x || 117 nm || 0.72x  | 
|-  | |-  | ||
| − | |   | + | | 96 nm || 0.82x || ?nm || ?x  | 
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|-  | |-  | ||
| − | | ||   | + | | 0.120 µm<sup>2</sup> || ?x || 0.127 µm<sup>2</sup> || 0.52x  | 
|-  | |-  | ||
| − | |   | + | |  || || 0.155 µm<sup>2</sup> ||    | 
| − | + | {{scrolling table/end}}  | |
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== 28 nm Microprocessors ==  | == 28 nm Microprocessors ==  | ||
Revision as of 04:20, 24 April 2016
The 28 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 32 nm and 22 nm processes. Commercial integrated circuit manufacturing using 28 nm process began in 2011. This technology superseded by commercial 22 nm process.
Industry
| Fab | 
|---|
|  | 
| Contacted Gate Pitch | 
| Interconnect Pitch (M1P) | 
| SRAM bit cell (HD) | 
| SRAM bit cell (LP) | 
| Samsung | TSMC | ||
|---|---|---|---|
| Value | 40 nm Δ | Value | 40 nm Δ | 
| 90 nm | 0.70x | 117 nm | 0.72x | 
| 96 nm | 0.82x | ?nm | ?x | 
| 0.120 µm2 | ?x | 0.127 µm2 | 0.52x | 
| 0.155 µm2 | |||
28 nm Microprocessors
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28 nm System on Chips
- Intel
 
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