Revision as of 20:11, 23 April 2016

Semiconductor lithography processes technology

1 nm 2 nm 3 nm 5 nm 7 nm 10 nm 14 nm 16 nm 20 nm 22 nm 28 nm 32 nm 40 nm 45 nm 55 nm 65 nm 80 nm 90 nm 110 nm 130 nm 150 nm 180 nm 220 nm 240 nm 250 nm 280 nm 350 nm 500 nm 600 nm 650 nm 700 nm 750 nm 800 nm 1 µm 1.2 µm 1.3 µm 1.5 µm 2 µm 2.5 µm 3 µm 3.5 µm 5 µm 6 µm 7 µm 8 µm 10 µm 16 µm 20 µm 50 µm

v · d · e

The 90 nm lithography process is a full node semiconductor manufacturing process following the 110 nm process stopgap. Commercial integrated circuit manufacturing using 90 nm process began in 2004. This technology was superseded by the 80 nm process (HN) / 65 nm process (FN) in 2006.

Industry

Intel

• 300mm (12-inch) wafers

90 nm Microprocessors

This list is incomplete; you can help by expanding it.

90 nm System on Chips

This list is incomplete; you can help by expanding it.

90 nm Microarchitectures

This list is incomplete; you can help by expanding it.