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Difference between revisions of "45 nm lithography process"

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{{Lithography processes}}
 
{{Lithography processes}}
The '''45 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[65 nm lithography process|65 nm process]]. Commercial [[integrated circuit]] manufacturing using 45 nm process began in 2007. This technology was superseded by the [[40 nm lithography process|40 nm process]] (HN) / [[32 nm lithography process|32 nm process]] (FN) in 2010.
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The '''45 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[55 nm lithography process|55 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 45 nm process began in 2007. This technology was superseded by the [[40 nm lithography process|40 nm process]] (HN) / [[32 nm lithography process|32 nm process]] (FN) in 2010.
  
 
== 45 nm Microprocessors==
 
== 45 nm Microprocessors==

Revision as of 16:23, 15 April 2016

The 45 nm lithography process is a full node semiconductor manufacturing process following the 55 nm process stopgap. Commercial integrated circuit manufacturing using 45 nm process began in 2007. This technology was superseded by the 40 nm process (HN) / 32 nm process (FN) in 2010.

45 nm Microprocessors

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45 nm System on Chips

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45 nm Microarchitectures

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