From WikiChip
Difference between revisions of "WikiChip"
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Semiconductor manufacturing processes | Semiconductor manufacturing processes | ||
</h3> | </h3> | ||
− | {{main/i1|65px| | + | {{main/i1|65px|10 µm lithography process|10 µm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|6 µm lithography process|6 µm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|3 µm lithography process|3 µm}} |
− | {{main/i1|65px|1. | + | {{main/i1|65px|1.5 µm lithography process|1.5 µm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|1 µm lithography process|1 µm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|800 nm lithography process|800 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|600 nm lithography process|600 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|350 nm lithography process|350 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|250 nm lithography process|250 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|180 nm lithography process|180 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|130 nm lithography process|130 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|90 nm lithography process|90 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|65 nm lithography process|65 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|45 nm lithography process|45 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|32 nm lithography process|32 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|22 nm lithography process|22 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|14 nm lithography process|14 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|10 nm lithography process|10 nm}} |
− | {{main/i1|65px| | + | {{main/i1|65px|7 nm lithography process|7 nm}} |
+ | {{main/i1|65px|5 nm lithography process|5 nm}} | ||
</div> | </div> | ||
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