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700 nm lithography process
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The 700 nanometer (700 nm) lithography process is was semiconductor manufacturing process following the 1 µm process. Commercial integrated circuit manufacturing using 700 nm process began in early 1990s. 700 nm and was phased out and later replaced by 650 nm, 600 nm, and 500 nm processes.

Industry[edit]

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
Metal Layers​
SRAM bit cell
AMD
 
1993
 ? nm
 ? nm
3
 ? µm2

700 nm Microprocessors[edit]

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