Semiconductor & Computer Engineering
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Difference between revisions of "600 nm lithography process"
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Latest revision as of 06:15, 20 July 2018
Semiconductor lithography processes technology
The 600 nanometer (600 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry[edit]
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (BiCMOS) | Intel (CMOS) | NEC | IBM | Motorola | HP |
|---|---|---|---|---|---|
| P652, P653 | CMOS-4S | CMOS14B | |||
| 1994 | 1994 | 1992 | 1993 | 1994 | |
| Value | Value | Value | Value | Value | Value |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm² | ? µm² | ? µm² | ? µm² | ? µm² | ? µm² |
600 nm Microprocessors[edit]
- Intel
- MIPS
This list is incomplete; you can help by expanding it.
600 nm Microarchitectures[edit]
This list is incomplete; you can help by expanding it.
