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Difference between revisions of "10 nm lithography process"

(10 nm Microprocessors)
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{{expand list}}
 
{{expand list}}
  
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== References ==
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{{reflist}}
  
 
[[Category:Lithography]]
 
[[Category:Lithography]]

Revision as of 15:52, 6 December 2016

The 10 nanometer (10 nm) lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial mass production of integrated circuit manufacturing using 10 nm process begun in late 2016. This technology is set to be replaced by 7 nm process 2019.

Industry

Symbol version future.svg Preliminary Data! Information presented in this article deal with future products, data, features, and specifications that have yet to be finalized, announced, or released. Information may be incomplete and can change by final release.


Fab
Process Name​
1st Production​
 ​
Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell (HP)​
SRAM bit cell (HD)
Intel Samsung TSMC
P1274 10LPE
1st generation; 10 nm Low Power Early
, 10LPP
2nd generation; 10 nm Low Power Performance
, 10LPU
3rd generation; 10 nm Low Power Ultimate
2017 2016 2017
Value 14 nm Δ Value 14 nm Δ Value 16 nm Δ
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
54 nm[1] 0.77x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? µm2  ?x 0.049 µm2 0.61x  ? µm2  ?x
 ? µm2  ?x 0.040 µm2 0.63x  ? µm2  ?x

10 nm Microprocessors

This list is incomplete; you can help by expanding it.

10 nm Microarchitectures

This list is incomplete; you can help by expanding it.

References

  1. Merritt, Rick. (2016, August 16) "Intel Grabs ARM for 10nm Foundry". EE Times, . Retrieved August 16, 2016, from http://www.eetimes.com/document.asp?doc_id=1330311.