The 2 µm lithography process was the semiconductor process technology used by the some semiconductor companies in the mid to late 1980s. By the mid 80s this process was replaced by 1.5 µm, 1.3 µm, and 1.2 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

Intel	Intel	Toshiba	STMicro	Motorola	TI	AMD
P414.1 (HMOS-II)	P421.X (HMOS-E)		BCD-Offline
1980	1980	1986	1992
? nm	? nm	? nm	? nm	? nm	? nm	? nm
? nm	? nm	? nm	? nm	? nm	? nm	? nm
? µm²	? µm²	? µm²	? µm²	? µm²	? µm²	? µm²

Microprocessors

• Motorola
  • 68020
• MIPS
  • R2000
• DEC
  • CVAX
• TI
  • SBR9000
• AMD
  • Am29100
  • Am29500

This list is incomplete; you can help by expanding it.

References

• Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984.