28 nm lithography process

Semiconductor lithography processes technology

1 nm • 18A
2 nm • 3 nm
5 nm • 7 nm
10 nm • 12 nm
14 nm • 16 nm
20 nm • 22 nm
28 nm • 32 nm
40 nm • 45 nm
55 nm • 65 nm
80 nm • 90 nm
110 nm • 130 nm
150 nm • 180 nm
220 nm • 240 nm
250 nm • 280 nm
350 nm • 500 nm
600 nm • 650 nm
700 nm • 750 nm
800 nm
1 µm • 1.2 µm
1.3 µm • 1.5 µm
2 µm • 2.5 µm
3 µm • 3.5 µm
5 µm • 6 µm
7 µm • 8 µm
10 µm • 16 µm
20 µm • 50 µm

The 28 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 32 nm and 22 nm processes. Commercial integrated circuit manufacturing using 28 nm process began in 2011. This technology superseded by commercial 22 nm process.

Industry

Fab
Wafer

Contacted Gate Pitch
Interconnect Pitch (M1P)
SRAM bit cell (HD)
SRAM bit cell (LP)
SRAM bit cell (HC)

Samsung		TSMC		GlobalFoundries		STMicroelectronics		UMC
300mm
Value	40 nm Δ	Value	40 nm Δ	Value	40 nm Δ	Value	40 nm Δ	Value	40 nm Δ
90 nm	0.70x	117 nm	0.72x	?nm	?x	?nm	?x	?nm	?x
96 nm	0.82x	?nm	?x	?nm	?x	?nm	?x	?nm	?x
0.120 µm²	?x	0.127 µm²	0.52x	0.120 µm²	?x	0.120 µm²	?x	0.124 µm²	?x
		0.155 µm²				0.197 µm²	?x	? µm²	?x
						0.152 µm²	?x

28 nm Microprocessors

AMD
- A8
- A10

This list is incomplete; you can help by expanding it.

28 nm System on Chips

Intel (Fab'ed by TSMC)
- Atom x3

This list is incomplete; you can help by expanding it.

WikiChip

The Fuse Coverage

Social Media

Companies

Microarchitectures

Technology Nodes

Intel

AMD

ARM

Cavium

Samsung

Intel

AMD

Ampere

Apple

Cavium

HiSilicon

MediaTek

NXP

Qualcomm

Renesas

Samsung

Industry

28 nm Microprocessors

28 nm System on Chips