The 16 nm lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. This technology is set to replaced by 14 nm process (HN) (2014) and 10 nm process (FN) in 2017.

Industry

Fab
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Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

TSMC
Value	20 nm Δ
48 nm	N/A
? nm
? nm
90 nm	1.03x
64 nm	1.00x
0.07 µm2	0.55x

16 nm Microprocessors

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16 nm System on Chips

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16 nm Microarchitectures

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