The 20 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 22 nm and 16 nm processes. Commercial integrated circuit manufacturing using 20 nm process began in 2014. This technology superseded by commercial 16 nm process.

Industry

Fab
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Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

Samsung		TSMC
Value	28 nm Δ	Value	28 nm Δ
64 nm	0.71x	87 nm	0.71x
64 nm	0.67x	67 nm	0.70x
? µm2	?x	0.07 µm2	0.45x

20 nm Microprocessors

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20 nm System on Chips

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20 nm Microarchitectures

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