The 10 nanometer (10 nm) lithography process is a full node semiconductor manufacturing process following the 14 nm process stopgap. The term "10 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial integrated circuit manufacturing using 10 nm process is set to begin in 2017. This technology is set to be replaced by 7 nm process 2019.

Industry

Preliminary Data! Information presented in this article deal with future products, data, features, and specifications that have yet to be finalized, announced, or released. Information may be incomplete and can change by final release.

Fab
Process Name​
1st Production​
​
Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell (HP)​
SRAM bit cell (HD)

Intel		Samsung		TSMC
P1274		10LPE, 10LPP
2017		2016		2017
Value	14 nm Δ	Value	14 nm Δ	Value	16 nm Δ
? nm	?x	? nm	?x	? nm	?x
? nm	?x	? nm	?x	? nm	?x
? nm	?x	? nm	?x	? nm	?x
54 nm	0.77x	? nm	?x	? nm	?x
? nm	?x	? nm	?x	? nm	?x
? µm2	?x	0.049 µm2	0.61x	? µm2	?x
? µm2	?x	0.040 µm2	0.63x	? µm2	?x

10 nm Microprocessors

This list is incomplete; you can help by expanding it.

10 nm System on Chips

• MediaTek Helio X30
• Qualcomm Snapdragon 830

This list is incomplete; you can help by expanding it.

10 nm Microarchitectures

• Intel
  • Cannonlake
  • Icelake

This list is incomplete; you can help by expanding it.