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55 nm lithography process
Revision as of 07:50, 28 May 2017 by David (talk | contribs) (55 nm Microprocessors)

The 55 nanometer (55 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 65 nm and 45 nm processes. Commercial integrated circuit manufacturing using 55 nm process began in late 2006 by companies such as TSMC and NEC. This technology superseded by commercial 45 nm process.

List of 55 nm microprocessors

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