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From WikiChip
600 nm lithography process
Semiconductor lithography processes technology |
|
The 600 nm lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Intel (BiCMOS) | Intel (CMOS) | NEC | IBM | Motorola | HP |
---|---|---|---|---|---|
P852 | CMOS-4S | CMOS14B | |||
1994 | 1994 | 1992 | 1993 | 1994 | |
Value | Value | Value | Value | Value | Value |
? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
600 nm Microprocessors
- Intel
- MIPS
This list is incomplete; you can help by expanding it.
600 nm Microarchitectures
This list is incomplete; you can help by expanding it.