The 500 nm lithography process is a full node semiconductor manufacturing process following the 600 nm process. Commercial integrated circuit manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by 350 nm in 1995.

Industry

Fab
Process Name​
1st Production​
​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

Intel
P852
1994
Value	800 nm Δ
? nm	?x
? nm	?x
44 µm2	0.40x

500 nm Microprocessors

• Sun
  • microSPARC II, 1994

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500 nm Microarchitectures

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