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Difference between revisions of "90 nm lithography process"
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Revision as of 01:57, 6 November 2017
The 90 nanometer (90 nm) lithography process is a full node semiconductor manufacturing process following the 110 nm process stopgap. Commercial integrated circuit manufacturing using 90 nm process began in 2003. This technology was superseded by the 80 nm process (HN) / 65 nm process (FN) in 2006.
Industry
Introduced in late 2002, Intel's 90 nm process became the first volume production to introduce strained silicon transistors.
Fab |
---|
Process Name |
1st Production |
Type |
Wafer |
Metal Layers |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
DRAM bit cell |
Intel | TSMC | Samsung | Fujitsu | IBM / Toshiba / Sony / AMD / Chartered | Motorola | TI | |||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
P1262 | CS-100 / CS-101 | HiPerMOS 8 | |||||||||||
2002 | 2003 | 2003 | 2004 | 2003 | 2004 | 2005 | |||||||
Bulk | PDSOI | Bulk | |||||||||||
300mm | |||||||||||||
7 | 10 | 9 | |||||||||||
Value | 130 nm Δ | Value | 130 nm Δ | Value | 130 nm Δ | Value | 130 nm Δ | Value | 130 nm Δ | Value | 130 nm Δ | Value | 130 nm Δ |
260 nm | 0.82x | 240 nm | 0.77x | 245 nm | 0.70x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
220 nm | 0.63x | 240 nm | 0.71x | 245 nm | 0.70x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
1.0 µm² | 0.50x | 0.999 µm² | 0.47x | 0.999 µm² | ?x | 1.07 µm² | 0.54x | 0.999 µm² | ?x | ? µm² | ?x | ? µm² | ?x |
0.275 µm² | 0.19 µm² | ?x |
90 nm Microprocessors
- AMD
- Cavium
- HAL (Fujitsu)
- IBM
- Loongson
- Qualcomm
- Sun
- Intel
This list is incomplete; you can help by expanding it.
90 nm Microarchitectures
This list is incomplete; you can help by expanding it.