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Difference between revisions of "600 nm lithography process"

(Industry)
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! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] !! [[HP]]
 
! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] !! [[HP]]
 
|- style="text-align: center;"
 
|- style="text-align: center;"
| || || || CMOS-4S || || CMOS14B
+
| || P652, P653 || || CMOS-4S || || CMOS14B
 
|- style="text-align: center;"
 
|- style="text-align: center;"
 
| 1994 || 1994 || 1992 || 1993 || 1994 ||  
 
| 1994 || 1994 || 1992 || 1993 || 1994 ||  

Revision as of 01:42, 12 May 2017

The 600 nanometer (600 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel (BiCMOS) Intel (CMOS) NEC IBM Motorola HP
P652, P653 CMOS-4S CMOS14B
1994 1994 1992 1993 1994
Value Value Value Value Value Value
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm²  ? µm²  ? µm²  ? µm²  ? µm²  ? µm²

600 nm Microprocessors

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600 nm Microarchitectures

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