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Difference between revisions of "16 nm lithography process"
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Revision as of 17:57, 6 September 2016
The 16 nanometer (16 nm) lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. The term "16 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. This technology is set to be replaced with 10 nm process in 2017.
Industry
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Fin Pitch |
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Contacted Gate Pitch |
Interconnect Pitch (M1P) |
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16 nm Microprocessors
- PEZY PEZY-SC2
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16 nm System on Chips
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16 nm Microarchitectures
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