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Difference between revisions of "600 nm lithography process"
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== 600 nm Microarchitectures == | == 600 nm Microarchitectures == | ||
* Intel | * Intel | ||
+ | ** {{intel|microarchitectures/80486|80486}} (later models) | ||
** {{intel|microarchitectures/p5|P5}} | ** {{intel|microarchitectures/p5|P5}} | ||
{{expand list}} | {{expand list}} |
Revision as of 12:52, 5 September 2016
The 600 nanometer (600 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Intel (BiCMOS) | Intel (CMOS) | NEC | IBM | Motorola | HP |
---|---|---|---|---|---|
CMOS-4S | CMOS14B | ||||
1994 | 1994 | 1992 | 1993 | 1994 | |
Value | Value | Value | Value | Value | Value |
? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
600 nm Microprocessors
- Intel
- MIPS
This list is incomplete; you can help by expanding it.
600 nm Microarchitectures
This list is incomplete; you can help by expanding it.