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Difference between revisions of "1 µm lithography process"
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− | ! [[Intel]] (CHMOS IV) !! [[HP]] | + | ! [[Intel]] (CHMOS IV) !! [[HP]] !! [[National Semiconductor|National]] (BiCMOS) |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | P648 || CMOS26 | + | | P648 || CMOS26 || BiCMOS III |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | 1987 || 1991 | + | | 1987 || 1991 || 1988 |
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− | ! Value !! Value | + | ! Value !! Value !! Value |
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− | | ? nm || ? nm | + | | ? nm || ? nm || ? nm |
|- | |- | ||
− | | ? nm || ? nm | + | | ? nm || ? nm || ? nm |
|- | |- | ||
− | | 220 µm<sup>2</sup> || ? µm<sup>2</sup> | + | | 220 µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> |
{{scrolling table/end}} | {{scrolling table/end}} | ||
Revision as of 06:31, 27 April 2016
The 1 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 800 nm, 650 nm, and 600 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Intel (CHMOS IV) | HP | National (BiCMOS) |
---|---|---|
P648 | CMOS26 | BiCMOS III |
1987 | 1991 | 1988 |
Value | Value | Value |
? nm | ? nm | ? nm |
? nm | ? nm | ? nm |
220 µm2 | ? µm2 | ? µm2 |
1 µm Microprocessors
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1 µm Microcontrollers
- Intel
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