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Difference between revisions of "6 µm lithography process"
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− | The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes. | + | The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of early to mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes. |
== Industry == | == Industry == |
Revision as of 06:44, 26 April 2016
The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the years of early to mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.
Industry
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Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch |
Metal Layers |
Technology |
Wafer |
Microprocessors
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