Semiconductor & Computer Engineering
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Difference between revisions of "800 nm lithography process"
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[[Category:Lithography]] | [[Category:Lithography]] | ||
Revision as of 20:24, 24 April 2016
Semiconductor lithography processes technology
The 650 nm lithography process was a semiconductor manufacturing process used by the leading integrated circuit manufacturers in early 1990s. This process was later replaced by 650 nm, 600 nm, and 500 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (BICMOS) | Intel (CHMOS V) | Intel (CMOS) | TI (CMOS) | TI (BiCMOS) | Cypress | AMD | Motorola | NEC | HP |
|---|---|---|---|---|---|---|---|---|---|
| P650 | CMOS26B | ||||||||
| 1991 | 1990 | 1989 | 1991 | 1991 | 1989 | 1991 | 1991 | 1991 | 1991 |
| Value | Value | Value | Value | Value | Value | Value | Value | Value | Value |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
800 nm Microprocessors
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