Semiconductor & Computer Engineering
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Difference between revisions of "800 nm lithography process"
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| − | {{ | + | {{lithography processes}} |
| − | The ''' | + | The '''650 nm lithography process''' was a semiconductor manufacturing process used by the leading [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes. |
| − | == | + | == Industry == |
| − | + | {{scrolling table/top|style=text-align: right; | first=Fab | |
| + | |Process Name | ||
| + | |1st Production | ||
| + | | | ||
| + | |Contacted Gate Pitch | ||
| + | |Interconnect Pitch (M1P) | ||
| + | |SRAM bit cell | ||
| + | }} | ||
| + | {{scrolling table/mid}} | ||
| + | |- | ||
| + | ! [[Intel]] (BICMOS) !! [[Intel]] (CHMOS V) !! [[Intel]] (CMOS) !! [[TI]] (CMOS) !! [[TI]] (BiCMOS) !! [[Cypress]] !! [[AMD]] !! [[Motorola]] !! [[NEC]] !! [[HP]] | ||
| + | |- style="text-align: center;" | ||
| + | | || || P650 || || || || || || || CMOS26B | ||
| + | |- style="text-align: center;" | ||
| + | | 1991 || 1990 || 1989 || 1991 || 1991 || 1989 || 1991 || 1991 || 1991 || 1991 | ||
| + | |- | ||
| + | ! Value !! Value !! Value !! Value !! Value !! Value !! Value !! Value !! Value !! Value | ||
| + | |- | ||
| + | | ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm | ||
| + | |- | ||
| + | | ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm | ||
| + | |- | ||
| + | | ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> | ||
| + | {{scrolling table/end}} | ||
| + | |||
| + | == 800 nm Microprocessors == | ||
| + | * Intel | ||
| + | ** {{intel|80486}}, 1989 | ||
| + | ** {{intel|pentium (1992)|Pentium}}, 1992 | ||
| + | * Sun | ||
| + | ** {{sun|microSPARC I}}, 1992 | ||
| + | {{expand list}} | ||
| − | |||
[[Category:Lithography]] | [[Category:Lithography]] | ||
Revision as of 19:59, 24 April 2016
Semiconductor lithography processes technology
The 650 nm lithography process was a semiconductor manufacturing process used by the leading integrated circuit manufacturers in early 1990s. This process was later replaced by 650 nm, 600 nm, and 500 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (BICMOS) | Intel (CHMOS V) | Intel (CMOS) | TI (CMOS) | TI (BiCMOS) | Cypress | AMD | Motorola | NEC | HP |
|---|---|---|---|---|---|---|---|---|---|
| P650 | CMOS26B | ||||||||
| 1991 | 1990 | 1989 | 1991 | 1991 | 1989 | 1991 | 1991 | 1991 | 1991 |
| Value | Value | Value | Value | Value | Value | Value | Value | Value | Value |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
800 nm Microprocessors
- Intel
- Sun
- microSPARC I, 1992
This list is incomplete; you can help by expanding it.