Semiconductor & Computer Engineering
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Difference between revisions of "600 nm lithography process"
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| − | | ? nm | + | | ? nm || ? nm || ? nm || ? nm || ? nm |
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| − | | ? µm<sup>2</sup> | + | | ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> |
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Revision as of 18:46, 24 April 2016
Semiconductor lithography processes technology
The 600 nm lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (BiCMOS) | Intel (CMOS) | NEC | IBM | Motorola |
|---|---|---|---|---|
| CMOS-4S | ||||
| 1994 | 1994 | 1992 | 1993 | 1994 |
| Value | Value | Value | Value | Value |
| ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
600 nm Microprocessors
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600 nm Microarchitectures
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