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(Created page with "{{lithography processes}} The '''600 nm lithography process''' was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 2000s. This...")
 
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{{lithography processes}}
 
{{lithography processes}}
The '''600 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 2000s. This process was later replaced by [[500 nm]] and [[350 nm]] processes.
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The '''600 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[500 nm]] and [[350 nm]] processes.
  
 
== Industry ==
 
== Industry ==

Revision as of 18:38, 24 April 2016

The 600 nm lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel
 
1994
Value
 ? nm
 ? nm
 ? µm2

600 nm Microprocessors

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600 nm Microarchitectures

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