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Difference between revisions of "600 nm lithography process"
(Created page with "{{lithography processes}} The '''600 nm lithography process''' was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 2000s. This...") |
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− | The '''600 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early | + | The '''600 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[500 nm]] and [[350 nm]] processes. |
== Industry == | == Industry == |
Revision as of 18:38, 24 April 2016
The 600 nm lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Intel |
---|
1994 |
Value |
? nm |
? nm |
? µm2 |
600 nm Microprocessors
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600 nm Microarchitectures
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