Revision as of 15:51, 24 April 2016

Semiconductor lithography processes technology

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The 500 nm lithography process is a full node semiconductor manufacturing process following the 600 nm process. Commercial integrated circuit manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by 350 nm in 1995.

500 nm Microprocessors

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500 nm Microarchitectures

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