Revision as of 18:23, 23 April 2016

Semiconductor lithography processes technology

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The 130 nm lithography process is a full node semiconductor manufacturing process following the 150 nm process stopgap. Commercial integrated circuit manufacturing using 130 nm process began in 2001. This technology was replaced by with 110 nm process (HN) in 2003 and 90 nm process (FN) in 2004.

130 nm Microprocessors

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130 nm System on Chips

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130 nm Microarchitectures

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